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Emilie Despiau-Pujo
Status : Post-Doc
Email : emilie.despiau lpp.polytechnique.fr
Tel : +33(0)169335958
Room : 05-1004C
Laboratoire de Physique des Plasmas
Ecole Polytechnique, route de Saclay
F-91128 Palaiseau Cedex
Research interests
Plasma processing for photonics/optoelectronics, low pressure inductive chlorine discharges, fundamentals of plasma-surface interactions, molecular dynamics simulations, fluid modelling.
Publications
Low energy Ar+ bombardment of GaN surfaces : A statistical study of ion reflection and sputtering
E. Despiau-Pujo and P. Chabert
J. Vac. Sci. Technol. A, Vol 28 (2010) 1263
MD simulations of GaN sputtering by Ar+ ions : Ion-induced damage and near-surface modification under continuous bombardment
E. Despiau-Pujo and P. Chabert
J. Vac. Sci. Technol. A, Vol 28 (2010) 1105
Simulations of radical and ion fluxes on wafer in a Cl2/Ar ICP discharge : confrontation with GaAs and GaN etch experiments
E. Despiau-Pujo, P. Chabert, S. Bansropun, D. Thénot, P. Plouhinec and S. Cassette
J. Vac. Sci. Technol. B, Vol 28 (2010) 693
Global model of instabilities in low-pressure inductive chlorine discharges
E. Despiau-Pujo and P. Chabert
Plasma Sources Sci. Technol. 18 (2009) 045028
Velocity distribution function of sputtered Ga atoms during inductively coupled Ar plasma treatment of a GaAs surface
E. Despiau-Pujo, P. Chabert, R. Ramos, G. Cunge, N. Sadeghi
J. Vac. Sci. Technol. A, Vol 27 (2009) 356
Comparison between fluid simulations and experiments in inductively coupled Ar/Cl2 plasmas
C.S. Corr, E. Despiau-Pujo, P. Chabert, W.G. Graham, F.G. Marro, D.B. Graves
J. Phys. D. : Appl. Phys. 41 (2008) 185202
Molecular dynamics simulations of GaAs sputtering under low energy Ar ion bombardment
E. Despiau-Pujo, P. Chabert, D.B. Graves
J. Vac. Sci. Technol. A 26 (2008) 274
Brief vitae
2009 - present : Postdoc - EECS (UC Berkeley) / LPP (Ecole Polytechnique)
2006 - 2009 : PhD in Plasma Physics - LPP, Ecole Polytechnique, France.
Etching of III-V semiconductors in inductively coupled chlorine plasmas
2003 - 2006 : Magistere (master’s degree) in Fundamental Physics
* Master 2 (MS) in Plasma Physics - Ecole Polytechnique, Palaiseau, France
* Master 1 in Fundamental & Applied Physics - Imperial College, London, England
* Licence (BS) in Fundamental Physics - University Paris 11, Orsay, France
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