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Publications
2010
Low energy Ar+ bombardment of GaN surfaces : A statistical study of ion reflection and sputtering
E. Despiau-Pujo and P. Chabert
J. Vac. Sci. Technol. A, Vol 28 (2010) 1263
MD simulations of GaN sputtering by Ar+ ions : Ion-induced damage and near-surface modification under continuous bombardment
E. Despiau-Pujo and P. Chabert
J. Vac. Sci. Technol. A, Vol 28 (2010) 1105
Simulations of radical and ion fluxes on wafer in a Cl2/Ar ICP discharge : confrontation with GaAs and GaN etch experiments
E. Despiau-Pujo, P. Chabert, S. Bansropun, D. Thénot, P. Plouhinec and S. Cassette
J. Vac. Sci. Technol. B, Vol 28 (2010) 693
Plasmas froids radiofréquence
P. Chabert et J.L. Raimbault
Images de la Physique 2009, 27 (2010)
On electric field measurements in surface dielectric barrier discharge
S.M. Starikovskaia, K. Allegraud, O. Guaitella, A. Rousseau
J. Phys. D : Appl. Phys. 43 (2010) 124007
Production of molecule on surface under plasma exposure : example of NO on Pyrex
D. Marinov, O. Guaitella, A. Rousseau, Y. Ionikh
J. Phys. D : Appl. Phys. 43 (2010) 115203
Time resolved nanosecond imaging of the propagation of a corona-like plasma discharge in water at positive applied voltage polarity
P. Ceccato, O. Guaitella, M.Rabeck, A. Rousseau
J. Phys. D : Appl. Phys. 43 (2010) 175202
The excitation structure in a micro-hollow cathode discharge in the normal regime at medium argon pressure
C. Lazzaroni, P. Chabert, A Rousseau and N Sadeghi
J. Phys. D : Appl. Phys. 43 (2010) 124008
Surface loss rates of H and Cl atoms in an inductively coupled plasma etcher using time-resolved electron density and optical emission measurements
G. A. Curley, L. Gatilova, S. Guilet, S. Bouchoule, J.P.Booth, G. S. Gogna, N. Sirse and S. Karkari
J. Vac. Sci. Technol. A 28, 360-372 (2010)
Dual frequency capacitive radiofrequency discharges : Effect of low-frequency power on electron density and ion flux
J P Booth, G Curley, D Marić and P Chabert
Plasma Sources Sci. Technol. 19, 015005 (2010)
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